| 摘要 |
<p>An optical proximity correction method comprises the steps of: setting a plurality of evaluation points on the edge of a fragment layout; separately matching a pattern contour simulated from the fragment layout to the evaluation points to calculate error values; setting the error values in a permissible error range among the error values as a first error group; setting the error values out of the permissible error range among the error values as a second error group; and moving the fragment layout so that the error values included in the second error group all have the same sign while an error value exists in the first error group. According to the optical proximity correction method, optical proximity correction of a light exposure mask pattern is allowed so that a target pattern is formed in a desired position.</p> |
