发明名称 ULTRA FINE PITCH AND SPACING INTERCONNECTS FOR SUBSTRATE
摘要 Some novel features pertain to a substrate that includes a first dielectric layer, a first interconnect, a first cavity, and a second interconnect. The first dielectric layer includes first and second surfaces. The first interconnect is embedded in the first dielectric layer. The first interconnect includes a first side and a second side. The first side is surrounded by the first dielectric layer, where at least a part of the second side is free of contact with the first dielectric layer. The first cavity traverses the first surface of the first dielectric layer to the second side of the first interconnect, where the first cavity overlaps the first interconnect. The second interconnect includes a third side and a fourth side, where the third side is coupled to the first surface of the first dielectric layer.
申请公布号 WO2015031280(A1) 申请公布日期 2015.03.05
申请号 WO2014US52568 申请日期 2014.08.25
申请人 QUALCOMM INCORPORATED 发明人 KIM, CHIN-KWAN;KUMAR, RAJNEESH;BCHIR, OMAR JAMES
分类号 H01L23/498 主分类号 H01L23/498
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