发明名称 |
Pellicles with reduced particulates |
摘要 |
Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask. |
申请公布号 |
US8968971(B2) |
申请公布日期 |
2015.03.03 |
申请号 |
US201313789894 |
申请日期 |
2013.03.08 |
申请人 |
Micro Lithography, Inc. |
发明人 |
Wang Ching-Bore |
分类号 |
G03F1/64 |
主分类号 |
G03F1/64 |
代理机构 |
Schwabe, Williamson & Wyatt |
代理人 |
Schwabe, Williamson & Wyatt |
主权项 |
1. A pellicle frame comprising:
a side member having a recess formed in a first surface thereof, the recess forming a closed path in the first surface; a locking member dimensioned to secure a membrane to the pellicle frame when a portion of the membrane is disposed between the recess and the locking member; and a non-adhesive attachment member to secure the side member to a photomask. |
地址 |
Sunnyvale CA US |