发明名称 MICROWAVE EXCURSION DETECTION FOR SEMICONDUCTOR PROCESSING
摘要 <p>Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.</p>
申请公布号 KR20150021494(A) 申请公布日期 2015.03.02
申请号 KR20147029227 申请日期 2013.05.07
申请人 APPLIED MATERIALS, INC. 发明人 HENDRICKSON SCOTT A.;KRIVULINA LILIYA;ROCHA ALVAREZ JUAN CARLOS;BALUJA SANJEEV
分类号 H01L21/768;H01L21/66;H01L21/67 主分类号 H01L21/768
代理机构 代理人
主权项
地址
您可能感兴趣的专利