矽蚀刻液及蚀刻方法,申请号TW099133290-传众专利搜索

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发明名称	矽蚀刻液及蚀刻方法
摘要
申请公布号	TWI475095	申请公布日期	2015.03.01
申请号	TW099133290	申请日期	2010.09.30
申请人	三菱瓦斯化学股份有限公司	发明人	藤音喜子;外赤隆二
分类号	C09K13/02;H01L21/308	主分类号	C09K13/02
代理机构		代理人	周良谋新竹市东大路1段118号10楼;周良吉新竹市东大路1段118号10楼
主权项	一种矽蚀刻液，用以将单晶矽非等向性地溶解，其特征为，该矽蚀刻液为包含以下成份之硷性水溶液：(1)1种以上之硷性氢氧化物，系选择自氢氧化钾、氢氧化钠及氢氧化四甲铵，(2)羟胺，及(3)硫脲类。
地址	日本

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