发明名称 |
METHODOLOGY FOR CLEANING OF SURFACE METAL CONTAMINATION FROM AN UPPER ELECTRODE USED IN A PLASMA CHAMBER |
摘要 |
<p>A method for cleaning metallic contaminants from an upper electrode used in a plasma chamber. The method comprises a step of soaking the upper electrode in a cleaning solution of concentrated ammonium hydroxide, hydrogen peroxide and water. The cleaning solution is free of hydrofluoric acid and hydrochloric acid. The method further comprises an optional step of soaking the upper electrode in dilute nitric acid and rinsing the cleaned upper electrode.</p> |
申请公布号 |
SG10201408436T(A) |
申请公布日期 |
2015.02.27 |
申请号 |
SGT10201408436 |
申请日期 |
2010.12.06 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
SHIH, HONG;AVOYAN, ARMEN;DESHMUKH, SHASHANK C.;CARMAN, DAVID |
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