发明名称 半導体装置
摘要 <p>An object is to provide a field effect transistor (FET) having a conductor-semiconductor junction, which has excellent characteristics, which can be manufactured through an easy process, or which enables high integration. Owing to the junction between a semiconductor layer and a conductor having a work function lower than the electron affinity of the semiconductor layer, a region into which carriers are injected from the conductor is formed in the semiconductor layer. Such a region is used as an offset region of the FET or a resistor of a semiconductor circuit such as an inverter. Further, in the case of setting up such an offset region and a resistor in one semiconductor layer, an integrated semiconductor device can be manufactured.</p>
申请公布号 JP5675886(B2) 申请公布日期 2015.02.25
申请号 JP20130088009 申请日期 2013.04.19
申请人 发明人
分类号 H01L21/336;G02F1/1368;H01L21/28;H01L21/822;H01L21/8234;H01L27/04;H01L27/06;H01L27/088;H01L29/423;H01L29/49;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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