发明名称 |
MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method of a silicon carbide single crystal having a high crystal quality.SOLUTION: A manufacturing method of a silicon carbide single crystal includes the steps of: bonding a seed crystal 20 consisting of silicon carbide and a support part 21 consisting of graphite; preparing silicon carbide raw material 40; and growing a silicon carbide single crystal 50 by sublimating the silicon carbide raw material 40 on a main surface 20a of the seed crystal 20 which is bonded to the support part 21. The growing step includes a step in which a temperature of the support part 21 is higher than that of the seed crystal 20. A thermal expansion coefficient of the support part 21 is 0.7 times or more and 0.9 times or less of the thermal expansion coefficient of the seed crystal 20.</p> |
申请公布号 |
JP2015036348(A) |
申请公布日期 |
2015.02.23 |
申请号 |
JP20130167660 |
申请日期 |
2013.08.12 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
OI NAOKI;KAWASE TOMOHIRO;SASAKI MAKOTO;HORI TSUTOMU;UETA SHUNSAKU |
分类号 |
C30B29/36 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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