发明名称 |
PIEZOELECTRIC ELEMENT MANUFACTURING METHOD, PIEZOELECTRIC ELEMENT, LIQUID JET HEAD, LIQUID JET APPARATUS, AND ULTRASONIC DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To work a diaphragm to have a desired thickness with high reproducibility and to provide a piezoelectric element having stable characteristics by suppressing variations in diaphragm film pressure.SOLUTION: A piezoelectric element manufacturing method includes: a first precursor application step for applying a first precursor 11a to a substrate 1; a first crystal layer formation step for forming a first crystal layer 11A by crystallizing the first precursor; a second precursor application step for applying a second precursor 11b onto the first crystal layer 11A; a recessed part formation step for forming a recessed part 14 in a part of the second precursor 11b through wet etching; a second crystal layer formation step for forming a second crystal layer 11B by crystallizing the second precursor 11b; a first electrode formation step for forming a first electrode 20 in the recessed part 14; a piezoelectric material layer formation step for forming a piezoelectric material layer 30 on the first electrode 20; and a second electrode formation step for forming a second electrode 40 on the piezoelectric material layer 30.</p> |
申请公布号 |
JP2015035516(A) |
申请公布日期 |
2015.02.19 |
申请号 |
JP20130166005 |
申请日期 |
2013.08.09 |
申请人 |
SEIKO EPSON CORP |
发明人 |
NAKAYAMA MASAO |
分类号 |
H01L41/29;B41J2/16;H01L41/047;H01L41/09;H01L41/332;H04R17/00;H04R31/00 |
主分类号 |
H01L41/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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