发明名称 METHOD OF FORMING PATTERN SURFACE
摘要 <p>PROBLEM TO BE SOLVED: To provide a pattern surface excellent in finishing and aesthetics, in a pattern surface formation method which comprises forming a coloring film and a pattern film in order.SOLUTION: A method of forming a pattern surface includes a step of forming a coloring film (A) by applying a coating material A and a step of applying a coating material B to the coloring film (A) to form a pattern film (B) of a thickness of 0.2-10 mm, so as to form the coloring film (A) and the pattern film (B) in order. The coating material A contains a resin ingredient and a granule, and the granule is (I) an infrared reflective granule or (II) an infrared reflective granule and an infrared transmissive granule, and the coating material B contains a synthetic resin emulsion, a granule and a water-soluble high-boiling-point compound and/or a water-soluble polymer compound.</p>
申请公布号 JP2015027667(A) 申请公布日期 2015.02.12
申请号 JP20140134613 申请日期 2014.06.30
申请人 BEKKU KK 发明人 KATAYAMA YASUNORI
分类号 B05D5/06;B05D7/00;E04F13/08 主分类号 B05D5/06
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