发明名称 Peeling Method
摘要 To improve the yield in a peeling process and improve the yield in a manufacturing process of a flexible light-emitting device or the like, a peeling method includes a first step of forming a peeling layer over a first substrate, a second step of forming a layer to be peeled including a first layer in contact with the peeling layer over the peeling layer, a third step of curing a bonding layer in an overlapping manner with the peeling layer and the layer to be peeled, a fourth step of removing part of the first layer overlapping with the peeled layer and the bonding layer to form a peeling starting point, and a fifth step of separating the peeling layer and the layer to be peeled. The peeling starting point is preferably formed by laser light irradiation.
申请公布号 US2015044792(A1) 申请公布日期 2015.02.12
申请号 US201414450463 申请日期 2014.08.04
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Aoyama Tomoya;Chida Akihiro;Komatsu Ryu
分类号 H01L51/56;H01L51/52;H01L51/00 主分类号 H01L51/56
代理机构 代理人
主权项 1. A manufacturing method comprising: forming a peeling layer over a first substrate; forming a first layer over and in contact with the peeling layer; forming a functional element over the peeling layer; attaching the first substrate and a second substrate to each other with a bonding layer and a frame-shaped partition surrounding the bonding layer, wherein the second substrate faces the functional element with the bonding layer therebetween; curing the bonding layer, wherein an end portion of the bonding layer is positioned on an inner side than an end portion of the peeling layer; and separating the peeling layer and the first layer.
地址 Kanagawa-ken JP