Resist composition and method for producing resist pattern

摘要

A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator,;;wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

主权项

1. A resist composition comprising:
a resin which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid; a resin, not having an acid-labile group, having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); an acid generator; and a solvent, wherein Raa1 represents a hydrogen atom or a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-1); wherein s represents 0 or 1; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; A10, A11 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; * represents a bond to a carbon atom; Raa2 represents a C1 to C18 saturated aliphatic hydrocarbon group in which one or more hydrogen atoms contained in the group are substituted with one or more fluorine atoms; and one or more —CH2— contained in the aliphatic hydrocarbon group may be replaced by —O— or —CO—; wherein Rab1 represents a hydrogen atom or a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula(a-2); wherein t represents 0 or 1; X30 X31 independently represents an oxygen atoms, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; A30 and A31 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A32 represents an optionally substituted C1 to C5 aliphatic hydrocarbon group or a single bond; * represents a bond to W1; W1 represents an admantanediyl group or a cyclohexanediyl group; n represents 1; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group, and one or more —CH2— contained in the aliphatic hydrocarbon group may be replaced by —O— or —CO—;and Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group, and one or more hydrogen atom contained in the fluorinated alkyl group may be replaced by a hydroxy group or a hydroxymethyl group.