发明名称 PRODUCTION METHOD OF ALUMINUM NITRIDE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To obtain high-quality aluminum nitride crystal stably in a liquid phase growth method for epitaxially growing an AlN crystal on a nitrided sapphire substrate of a seed crystal substrate by using a Ga-Al alloy melt.SOLUTION: A nitrided sapphire substrate whose top surface is subjected to an oxidation treatment is used as a seed crystal substrate 3, and nitrogen-containing gas is introduced into a Ga-Al alloy melt 5, to thereby epitaxially grow an aluminum nitride crystal on the seed crystal substrate 3 in the Ga-Al alloy melt 5.
申请公布号 JP2015024940(A) 申请公布日期 2015.02.05
申请号 JP20130156766 申请日期 2013.07.29
申请人 SUMITOMO METAL MINING CO LTD;TOHOKU UNIV 发明人 FUKUYAMA HIROYUKI;ADACHI MASAYOSHI;IIDA JUNJI;SUGIYAMA MASASHI;OYASU YASUHIRO
分类号 C30B29/38;C30B19/12 主分类号 C30B29/38
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