| 摘要 |
The objective of the present invention is to provide a method for manufacturing a nanowire element which enhances productivity by uniformly forming nanowires on an entire surface of a single substrate. To achieve this objective, the present invention relates to the method for manufacturing the nanowire element for forming nanowires on the entire surface area of entire substrate, comprising: a substrate preparation step of preparing the substrate for forming the nanowires; a substrate surface treatment step of soaking the prepared substrate in a polylysine solution for a specific duration of time; a substrate coating step of uniformly coating As atoms on the entire surface area of the substrate; and a nanowire-forming step of forming an InAsP nanowire alignment on the substrate which has been coated. |
