| 发明名称 |
DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM |
| 摘要 |
A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism for moving the turning flow generation mechanism along a surface of the substrate. The line-width uniformity of a pattern can be improved by forming turning flows in a desired region of the substrate and stirring the developer. |
| 申请公布号 |
US2015036110(A1) |
申请公布日期 |
2015.02.05 |
| 申请号 |
US201414450704 |
申请日期 |
2014.08.04 |
| 申请人 |
Tokyo Electron Limited |
发明人 |
YOSHIHARA Kousuke;KYOUDA Hideharu;MUTA Koshi;YAMAMOTO Taro;TAKIGUCHI Yasushi |
| 分类号 |
G03F7/30 |
主分类号 |
G03F7/30 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A developing apparatus comprising:
a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism that moves the turning flow generation mechanism along a surface of the substrate. |
| 地址 |
Tokyo JP |
