| 摘要 |
<p>An apparatus for processing a substrate of the present invention may comprise: an index unit having a port in which a container containing the substrate is placed and an index robot; a work processing unit in which process chambers processing the substrate are arranged on top of each other; a first path unit which is disposed between the work processing unit and the index unit and on which the substrates are mutually transferred; and a second path unit which is disposed to face the first path unit between the work processing unit and on which the substrate is transferred between the chambers. Each chamber may include: a center path divided into a first path and second path in a longitudinal direction by a partition member; first process modules multi-arranged vertically along the first path; second process modules multi-arranged vertically along the second path; and a first main transfer robot and a second main transfer robot installed in the first path and the second path, respectively.</p> |
