| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus, having an electrostatic chuck, which can effectively suppress electrification of the electrostatic chuck and a sample, or the like, regardless of the outgas discharged from the sample.SOLUTION: According to the present invention, the charged particle beam apparatus includes: an electrostatic chuck mechanism including a through hole serving as an exhaust pipe for exhausting a sample chamber space in a sample suction surface thereof; a pressure gauge for measuring a pressure of exhaust passing down the through hole; and a control device for controlling a voltage applied to the electrostatic chuck mechanism so as to stop applying the voltage, apply an application voltage lower than a usual voltage and/or stand by for applying the voltage, when a result of measurement by the pressure gauge is not lower than a predetermined value or is higher than the predetermined value.</p> |
