发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING MOLD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: A mold for manufacturing a semiconductor device is provided to prevent void or molding failure in a molding process by flowing encapsulant in a diagonal direction of a cavity. CONSTITUTION: An encapsulant is loaded in a port and flows from the port and a runner. The encapsulant is injected from the runner to a gate(130). A cavity(140) molds the substrate with the encapsulant from a gate. The cavity has four walls(141), four edges(142), and one bottom side(143). The gate is connected to one of four walls of the cavity. An air vent(150) exhausts the air in a molding process. The gate and the air vent are formed in the cavity to face each other in a diagonal direction.</p>
申请公布号 KR101488527(B1) 申请公布日期 2015.01.30
申请号 KR20080058966 申请日期 2008.06.23
申请人 发明人
分类号 H01L23/28 主分类号 H01L23/28
代理机构 代理人
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