发明名称 METHOD OF PREVENTING OXIDATION OF METAL FILM SURFACE AND SOLUTION OF PREVENTING OXIDATION
摘要 PURPOSE: A method of preventing oxidation of a metal film surface and the solution of preventing oxidation is provided to maintain the good condition of a metal surface by suppressing the interference of large amount of water which is supplied in a dicing process. CONSTITUTION: An inter-layer insulating film(1) is formed on a semiconductor substrate. A wiring pattern(7) comprises a barrier metal film and an aluminum(Al) film(72) covered in a barrier metal film(71). The wiring pattern(8) is composed of the Al film(82) covered in the barrier metal film(81). A via(6) comprises the barrier metal film(61) and a tungsten film(62) covered in the barrier metal film. A connection pad connected to the wiring pattern is formed through the via.
申请公布号 KR20120002426(A) 申请公布日期 2012.01.05
申请号 KR20110051163 申请日期 2011.05.30
申请人 FUJIFILM CORPORATION 发明人 MIZUTANI ATSUSHI;INABA TADASHI;TAKAHASHI TOMONORI;TAKAHASHI KAZUTAKA
分类号 H01L21/302;C11D3/30;C11D3/36 主分类号 H01L21/302
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