发明名称 |
LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD |
摘要 |
Provided is a lithography apparatus which forms a pattern on a substrate that includes a detector configured to detect a mark formed on the substrate; a controller configured to obtain a displacement amount of a position of the mark from a reference position thereof based on an output of the detector; wherein the controller is configured to obtain a representative value of, with respect to each of a plurality of marks associated with each sample shot region on the substrate, a plurality of the displacement amount respectively obtained based on outputs of the detector with respect to a plurality of the sample shot region, and obtain information relating to a form of a shot region on the substrate based on a plurality of the representative value respectively obtained with respect to the plurality of marks. |
申请公布号 |
US2015022797(A1) |
申请公布日期 |
2015.01.22 |
申请号 |
US201414334230 |
申请日期 |
2014.07.17 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MIYAZAKI Tadaki |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. A lithography apparatus which forms a pattern on a substrate, the apparatus comprising:
a detector configured to detect a mark formed on the substrate; a controller configured to obtain a displacement amount of a position of the mark from a reference position thereof based on an output of the detector; wherein the controller is configured to obtain a representative value of, with respect to each of a plurality of marks associated with each sample shot region on the substrate, a plurality of the displacement amount respectively obtained based on outputs of the detector with respect to a plurality of the sample shot region, and obtain information relating to a form of a shot region on the substrate based on a plurality of the representative value respectively obtained with respect to the plurality of marks. |
地址 |
Tokyo JP |