| 发明名称 |
PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING ELECTRONIC DEVICE |
| 摘要 |
A photoresist composition includes a polymer with repeat units having the structure;;wherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof. |
| 申请公布号 |
US2015021289(A1) |
申请公布日期 |
2015.01.22 |
| 申请号 |
US201313943007 |
申请日期 |
2013.07.16 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC ;DOW GLOBAL TECHNOLOGIES LLC |
发明人 |
OBER Matthias S.;JAIN Vipul;ETIENNE John B. |
| 分类号 |
G03F7/038;G03F7/26 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photoresist composition comprising:
a polymer comprising a plurality of repeat units having the structurewherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1— 18linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene; and
a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof. |
| 地址 |
Marlborough MA US |
