发明名称 FLUID NOZZLE, SUBSTRATE CLEANING APPARATUS, AND METHOD FOR CLEANING A SUBSTRATE
摘要 <p>An objective of the present invention is to provide a fluid nozzle having a cleaning effect more excellent than that of the related art, a substrate cleaning apparatus having the same, and a substrate cleaning method. The present invention provides a fluid nozzle including a nozzle body (2) having an inner front surface (213); an inner rear surface (214) that is opposite to and spaced apart from the inner front surface, and having a fluid chamber (3) formed by an inner bottom surface (216) to connect one end of the inner front surface (213) with one end of the inner rear surface (214) and an inner top surface (215); a gas-intake tube (4) formed through the inner top surface (215) so that the fluid chamber (3) communicates with the nozzle body (2), a liquid-intake tube (5) formed through the inner front surface (213) and introduced into the fluid chamber (3) to extend approximately to the inner rear surface (214); and a plurality of ejecting channels (6) formed through the respective inner surfaces (216), a substrate cleaning apparatus having the relevant fluid nozzle, and a substrate cleaning method using the substrate cleaning apparatus.</p>
申请公布号 KR20150007196(A) 申请公布日期 2015.01.20
申请号 KR20140008086 申请日期 2014.01.23
申请人 ELS SYSTEM TECHNOLOGY CO., LTD. 发明人 TENG CHIH MING
分类号 H01L21/302 主分类号 H01L21/302
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