| 摘要 |
PURPOSE:To provide a resist compsn. contg. a resist having alkylsilyl groups as protective groups, undergoing easily peeling and capable of being put to practical use and to provide a method for using the resist compsn. by which peeling is easily carried out. CONSTITUTION:A sulfolane compd. is added to a resist having alkylsilyl groups as protective groups which are released by an acid to vary the solubility of the resist in a developer to provide the objective resist compsn. When this resist compsn. is used, it is allowed to stand in an SO2 atmosphere after exposure and development, water is imparted and ashing is properly carried out by heating to peel the resist compsn. |
