| 摘要 |
本发明系关于一种乾膜光阻脱膜剂组成物、以及一种使用它之脱膜方法。;根据本发明之乾膜光阻脱膜剂组成物系包括预定的混合比之氢氧化物系化合物、链状胺化合物、三唑化合物、及纯水(H2O)；并具有：能够将乾膜光阻剂完全地去除、并且能够防止金属层之腐蚀、而且脱膜剂为可以再使用之长处。;According to the embodiments of the present invention, the dry film resist releasing agent composition includes a hydroxide compound, a chain amine compound, a triazole compound, and pure water (H2O) with a predetermined mixing ratio. Moreover, the present invention is provided with advantages of totally removing the dry film photoresist, presenting erosion of metal layers, and the releasing agent being reusable. |
