| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a deposition film possessing a deposition layer having a high adhesive strength by inhibiting deposition omission occurring at the time of deposition and capable of inhibiting the deterioration of gas barrier capacity as well as a manufacturing method and applications of the same.SOLUTION: The provided deposition film is a deposition film possessing a metal deposition layer atop a substrate film consisting of a vinyl alcohol-based copolymer such as an ethylene-vinyl alcohol copolymer, etc. where at least 0.01 ppm and no more than 100 ppm of an unsaturated aldehyde is included. It is more desirable to use, as the unsaturated aldehyde, at least one type selected from the group consisting of crotonaldehyde, 2,4-hexadienal, and 2,4,6-octatrienal, for example.</p> |
