| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for measuring position of stage capable of preventing the occurrence of measurement error in response to the error fluctuation of straightness of a reflective mirror, accurately measuring positional information of a stage and reducing the time of measurement, and to provide an exposing method, an exposing apparatus and a method of manufacturing a device whereby throughput and treating capacity are improved. SOLUTION: The method is composed of a first step in which errors of straightness of the reflective mirror 13, 14 are measured using interferometers 15a, 15b, 17a, 17b, a second step in which the positional information of the reflective mirror 13, 14 is measured using the interferometers 15a, 15b, 17a, 17b, and the positional information of the stage 10 is measured on the basis of this measured result and the measured result of the error of straightness in the first step, and a third step in which the error fluctuation of straightness is detected after carrying out the first step, and a judgment is made whether the first step should be carried out again or not on the basis of the detection result.</p> |
