| 摘要 |
<p>The present invention relates to a semiconductor cleaning apparatus which is capable of meeting conditions such as high cleaning effect, high-productivity maintenance, a low maintenance cost and an eco-friendly element when a semiconductor wafer or a liquid crystal display (LCD) substrate is cleaned. In addition, the present invention relates to a semiconductor cleaning apparatus which is capable of effectively removing contaminants exerting a fatal influence on the characteristics and yield of a semiconductor device while preventing the semiconductor wafer or LCD substrate from being polluted again or damaged due to static electric charges. According to the present invention, the semiconductor cleaning apparatus includes a deionized water supply unit for supply deionized water; an electrolyte supply unit for supplying an electrolyte; an electrolyte/deionized water mixing unit for mixing the deionized water supplied from the deionized water supply unit with the electrolyte supplied from the electrolyte supply unit at a predetermined ratio; an electrolytic bath for generating electrolytic ionized water based on the electrolytic solution provided from the electrolyte/deionized water mixing unit and the deionized water supplied from the deionized water supply unit; a buffer tank for storing the electrolytic ionized water flowing out from the electrolytic bath; a pH measuring unit for measuring pH of the electrolytic ionized water stored in the buffer tank; and an electrolytic ionized water supply unit for supplying the electrolytic ionized water stored in the buffer tank to a cleaning target.</p> |
