| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a black matrix resist composition having high sensitivity and excellent in property of retaining a line width in fine line patterns (development margin) in alkaline development. <P>SOLUTION: The color filter black matrix resist composition comprises (A) a carboxylic binder resin, (B) a compound having an ethylenically unsaturated group, (C) a photoinitiator system containing a thiol compound having a fluorene skeleton, (D) a black pigment and (E) an organic solvent. Preferred ratios of the components (A)-(D) are 10-30 mass%, 2-20 mass%, 2-15 mass% and 40-80 mass%, respectively, on the basis of the total mass except the component (E), and a preferred ratio of the thiol compound having the bisphenol skeleton in the photoinitiator system (C) is 20-70 mass%. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
