Lithographic apparatus having a chuck with a visco-elastic damping layer

摘要

A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.

主权项

1. A lithographic apparatus comprising:
a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in a cross-section of the radiation beam to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a chuck configured to hold and position an object, the chuck comprising a base and a constraining layer, and a damping layer comprising a viscoelastic material and provided between the base and the constraining layer, wherein at least one of the damping layer and constraining layer is segmented in a plane thereof to form at least two detached segments in said at least one of the damping layer and the constraining layer, wherein an elasticity modulus of the constraining layer is at least 10 times greater than an elasticity modulus of the damping layer, and wherein a thickness of the damping layer is between about 100 μm and 1000 μm.