发明名称 |
PHOTOCURABLE COMPOSITION AND METHODS FOR OPTICAL COMPONENT BY USING THE SAME |
摘要 |
In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm. |
申请公布号 |
WO2014208064(A1) |
申请公布日期 |
2014.12.31 |
申请号 |
WO2014JP03311 |
申请日期 |
2014.06.19 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HONMA, TAKESHI;ITO, TOSHIKI;YONEZAWA, SHIORI;CHIBA, KEIKO;YAMASHITA, KEIJI |
分类号 |
H01L21/027;B29C59/02;C08F2/44;C08F2/50 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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