| 摘要 |
<p>The present invention is a photoresist composition which contains (A) a polymer that has an acid-cleavable group, (B) an acid generator, and (C) a polymer that has a structural unit (I) represented by formula (1) and contains a fluorine atom. In formula (1), each of R1 and R2 independently represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of E1 and E2 represents an oxygen atom, *1-CO-O- or *1-CO-NH-; A represents a divalent group that has an acid-cleavable group or an alkali-cleavable group in a linking chain; G represents a single bond or an (n + 1)-valent linking group; and n represents an integer of 1-3.</p> |
