ACRYLATE-BASED RESIN POLYMER AND PHOTORESIST RESIN COMPOSITION COMPRISING THE SAME

摘要

The present invention provides an acrylate-based resin polymer and a photosensitive resin composition including the same. According to an embodiment of the present invention, provided is the acrylate-based resin polymer including one or more repeated units represented by Chemical Formula 1. In Chemical Formula 1, R1 to R3 are independently selected from a group consisting of the following: hydrogen; heavy hydrogen; a substituted or unsubstituted alkyl group; a substituted or unsubstituted alkoxy group; a substituted or unsubstituted cycloalkyl group; and a substituted or unsubstituted alkenyl group. According to an embodiment of the present invention, the acrylate-based resin polymer provides high contrast and/or high brightness.