| 摘要 |
The present invention relates to a substrate including Z-axis distortion correction, capable of accurately aligning a substrate and a mask regardless of manufacturing error of an alignment mark provided on a substrate or a mask, and a mask aligning method. The method for aligning a substrate and a mask comprises a recognition step of recognizing a substrate alignment mark and a mask alignment mark, a first correction step of additionally decreasing or increasing an amount of offset according to the degree of Z-axis distortion, a second correction step of controlling a moving unit on the basis of an amount of alignment movement calculated by using image data obtained in the recognition step and performing an aligning process once or repeatedly by moving the substrate or the mask to align the substrate and the mask, and an attachment step of attaching the substrate and the mask by controlling the moving unit. Since the second correction step, in which correction is performed using marks of the substrate and the mask, is performed after performing the first correction step, in which the degree of Z-axis distortion that may occur when the substrate and the mask are aligned is detected and an offset is set in advance, the substrate and the mask are more precisely aligned, and since a time for the second correction is reduced by the first correction step, an overall correction time can be reduced. |
