| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a resin which is used in a resist composition for pattern formation with an electron ray or a high energy ray at a wavelength of 300 nm or less and in a top coat composition for liquid immersion lithography, and has high water repellency, notably a high receding contact angle.SOLUTION: A fluorine-containing polymer compound has a repeating unit (a) represented by the general formula (2) in the figure and has a mass-average molecular weight of 1,000 to 1,000,000. (In the formula, Rrepresents a polymerizable double bond-containing group; Rrepresents a fluorine atom or a fluorine-containing alkyl group; Rrepresents a substituted or unsubstituted alkyl group or the like; and Wrepresents a single bond, a substituted or unsubstituted methylene group or the like.</p> |
