| 摘要 |
Disclosed are a mask for changing a deposition pattern and a thin film deposition method using the same. The disclosed mask includes a pattern bar which is installed in a frame and forms a deposition pattern and a pattern changing tool which changes the deposition pattern by moving the pattern bar. According to this structure, products with various standards are produced by one mask while changing the deposition pattern. Therefore, the burdens of the manufacture, management, and replacement of the mask are reduced and productivity is improved. |
