| 摘要 |
The HBP Free-POSS compounds of Formula I are superior to prior HB polymers and linear polymers in space and electronic applications because they have better resistance to electrons, protons and atomic oxygen, have superior out-gassing performance, and are transparent. They are used as coatings, films, adhesives, sealants and elastomers. |
| 主权项 |
1. A POSS polymer compound of formula I
[Ax]p[By]q Formula I wherein: Ax is a POSS entity including closed-caged T8, T10, or T12 or an open-cage T8, T10, or T12 or another non-POSS monomer, having x number of A-type functional groups selected from hydridosilyl (Si—H), vinyl, hydroxyl or alkoxysilyl, with all functionality being the same for a given monomer; x is an integer of 2 or more; p is an integer of 2 or more; and By is a POSS entity including closed-caged T8, T10, or T12 or an open-cage T8, T10, or T12, or another non-POSS monomer, having y number of B-type functional groups that are chosen to react with the A-type functional groups and are selected from vinyl, hydridosilyl (Si—H), alkoxysilyl or hydroxyl, with all functionality being the same for a given monomer; y is an integer of 3 or more; q is an integer of 2 or more; and when present, the non-POSS monomer is H(SiR2O)mSiR2H, vinyl-(SiR2O)mSiR2-vinyl, Si(OSiR2H)4, HSiR2CH2CH2SiR2H, H(Si(OR)2O)mSi(OR)2H, or vinyl(Si(OR)2O)mSi(OR)2vinyl, where R is C1-C5 alkyl or C6-C14 aryl, and m is 1 or more; provided that if A and B are both POSS entities, then x does not equal y; and provided that if A and B are both POSS entities, they are not identical entities; and provided that one of A or B must be a POSS entity; and wherein the polymer contains curable groups for further reaction, which curable groups are either initially present or have been added by a capping agent. |
