| 摘要 |
The invention relates to a method for producing at least one nanotip from a tip material, comprising providing a substrate (210) which consists of the tip material or has said material in the form of a coating, producing a mask from a mask material (220), wherein the mask material is selected so that, in a predefined reactive ion etching process, the mask material is removed at a lower etching rate than the tip material, and carrying out the reactive ion etching process in an etching chamber, wherein mask materials are additionally selected so that a gaseous component (230) is released from the mask material during the reactive ion etching process, said gaseous component not being released from the tip material during the reactive ion etching process, and wherein the method furthermore comprises the steps of detecting the gaseous component while the ion etching process is carried out, repeatedly determining during the ion etching process whether a quantity of the gaseous component in the etching chamber reaches a predefined lower threshold, and as soon as the lower threshold is reached: stopping the reactive ion etching process. |
