| 摘要 |
Solvent residues remaining in a processing vessel of a drying apparatus that dries an organic material film on a substrate can be efficiently removed in a short time. The drying apparatus (100) includes a processing vessel (1) capable of vacuum exhausting, a mounting board (3) as a support member to support a substrate (S) in the processing vessel (1), an ultraviolet ray irradiating device (5) radiating ultraviolet rays to the inside of the processing vessel (1), and a controller (6). The ultraviolet ray irradiating device (5) functions as a solvent decomposition means that breaks down an organic compound included in the solvent residues remaining in the processing vessel (1) into low molecular weight compounds after a substrate (S), that has completed the drying process, is discharged from the processing vessel (1). |
