PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method by which a pattern can be formed with a small range of fluctuations in line width (LWR) and a smaller degree of film reduction, to provide an actinic ray-sensitive or radiation-sensitive resin composition and an actinic ray-sensitive or radiation-sensitive film suitably usable for the above method, and to provide a method for manufacturing an electronic device including the above pattern forming method, and an electronic device.SOLUTION: The pattern forming method includes steps of: forming an actinic ray-sensitive or radiation-sensitive film by applying on a substrate an actinic ray-sensitive or radiation-sensitive resin composition which comprises a resin showing decrease in the solubility with an organic solvent by an action of an acid, a solvent, and a compound generating a component that forms an ionic bond with a polar group in the resin; exposing the actinic ray-sensitive or radiation-sensitive film; and developing the exposed actinic ray-sensitive or radiation-sensitive film by use of a developer containing an organic solvent to form a negative pattern.