| 摘要 |
<p>Provided are a polishing pad dresser, a polishing pad dressing device, and a polishing system. The polishing pad dresser comprises abrasive particles and a base body having a polishing surface. Here, the abrasive particles are integrated on the polishing surface, and the polishing surface includes a center polishing surface and an edge polishing surface connected with each other. Moreover, the edge polishing surface surrounds the center polishing surface, and the center polishing surface is a plane and higher than the edge polishing surface. The abrasive particles on the edge polishing surface can be higher than the abrasive particles on the center polishing surface as the center polishing surface is higher than the edge polishing surface while a polishing pad is dressed. If the indentation depth of the polishing pad dresser toward the polishing pad is relatively small, most of the abrasive particles on the edge polishing surface cannot be used for polishing. Therefore, the abrasive particles on the edge can be used less, and the possibility of peeling off can be reduced. Moreover, the possibility of a collision between the abrasive particles on the edge and the edge of the polishing pad can be reduced.</p> |
