RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist composition and a resist pattern forming method.SOLUTION: The resist composition contains: a base component whose solubility in a developer changes by the action of an acid; and an acid generator component which generates an acid upon exposure. The base component contains a polymer compound having a constituent unit represented by a formula (a0-1), and the acid generator component contains a compound represented by a formula (b1).