发明名称 |
CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a catadioptric projection objective that has tilted deflecting mirrors which allow imaging of patterns including sub-patterns oriented in various directions.SOLUTION: As to a first deflecting mirror having a first reflective coating with a reflectivity R(α) for s-polarized light and a reflectivity R(α) for p-polarized light both incident at a first angle of incidenceαaccording to (t-Δα)≤α<(t+Δα), and a second deflecting mirror having a second reflective coating with a reflectivity R(α) for s-polarized light and a reflectivity R(α) for p-polarized light both incident at a second angle of incidenceαaccording to (t-Δα)≤α≤(t+Δα), a first reflectivity sum Rfor s-polarized light of polar edge rays accumulated upon reflection on them is substantially equal to a second reflectivity sum Rfor p-polarized light of equatorial edge rays accumulated upon reflection.</p> |
申请公布号 |
JP2014225690(A) |
申请公布日期 |
2014.12.04 |
申请号 |
JP20140152263 |
申请日期 |
2014.07.25 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
RALF MUELLER;GENELMAYER AXEL;WOLFGANG SINGER |
分类号 |
H01L21/027;G02B17/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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