Acid generator, chemically amplified resist composition, and patterning process

摘要

The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat:;To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process.;

主权项

1. An acid generator generating a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat, wherein R represents a group represented by the following general formula (1-1), and A represents a hydrogen atom or a trifluoromethyl group,
(R1)(R2)N-L-  (1-1) wherein each of R1 and R2 independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted by a heteroatom, or R1 and R2 may be bonded to form a ring together with the nitrogen atom in the general formula (1-1), and L represents a divalent hydrocarbon group having 1 to 20 carbon atoms optionally substituted by a heteroatom, with the proviso that any one of R1, R2, and L contains a benzene ring.