发明名称 |
METHOD OF GROWING &bgr;-Ga2O3-BASED SINGLE CRYSTAL, &bgr;-Ga2O3-BASED SINGLE CRYSTAL SUBSTRATE AND PRODUCTION METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of growing a &bgr;-GaO-based single crystal which is used to grow a planar &bgr;-GaO-based single crystal, with shoulder expansion in the width direction suppressed, and provides a wide &bgr;-GaO-based seed single crystal, a &bgr;-GaO-based single crystal substrate using the method and a production method of the substrate.SOLUTION: A method of growing a &bgr;-GaO-based single crystal by an EFG method includes causing a GaO-based molten liquid 12 in a crucible 13 to rise to an opening 14b of a die 14 through a slit 14a of the die 14 and bringing a seed crystal 20 into contact with the GaO-based molten liquid 12 present in the opening 14b of the die 14 in a state where the horizontal position of the seed crystal 20 is deviated in the width direction W from the center in the width direction W, and pulling up the seed crystal 20 brought into contact with the GaO-based molten liquid 12 to grow a &bgr;-GaO-based single crystal 25. |
申请公布号 |
JP2014221707(A) |
申请公布日期 |
2014.11.27 |
申请号 |
JP20130102599 |
申请日期 |
2013.05.14 |
申请人 |
TAMURA SEISAKUSHO CO LTD;KOHA CO LTD |
发明人 |
KOSHI KIMIYOSHI;MASUI TAKEKAZU;TAKIZAWA MASARU |
分类号 |
C30B29/16;C30B15/34 |
主分类号 |
C30B29/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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