| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of precisely aligning a substrate under exposure and a photomask in a small-sized mask continuous exposure system for performing exposure by using a compact photomask arranged in a direction orthogonal to a conveyance direction of the substrate while continuously conveying the substrate. <P>SOLUTION: An imaging device 8 for slope observation is disposed upstream of an exposure head 3. The imaging device 8 images a light shielding layer (black matrix or electrode layer) formed inside an exposure region 11 on a substrate 10. The slope of the light shielding layer with respect to the conveyance direction (y-axis) of the substrate is determined from an image photographed by the imaging device 8. A drive device 12 rotates a photomask 4 to match the slope of a pattern 5 for pixel formation with respect to the y-axis to the slope of the shielding layer with respect to the y-axis. <P>COPYRIGHT: (C)2012,JPO&INPIT |
