发明名称 |
Composition containing at least one C7 sugar for alopecia treatment, cosmetic treatment of hair and nails, and care of hair, eyelashes, or nails |
摘要 |
The present invention relates to a composition including at least one C7 sugar, or derivative from esterification of said sugar, and a pharmaceutically acceptable carrier for treating alopecia. The present invention also relates to a method for cosmetically treating hair and nails, said method being intended to stimulate the growth thereof and/or slow the loss thereof. According to said method, a cosmetic composition including at least one C7 sugar, or derivative from esterification of said sugar, is administered. The present invention finally relates to a method for cosmetic care of hair and/or eyelashes and/or nails. |
申请公布号 |
US8894979(B2) |
申请公布日期 |
2014.11.25 |
申请号 |
US201013516333 |
申请日期 |
2010.12.15 |
申请人 |
Laboratoires Expanscience |
发明人 |
Baudouin Caroline;Msika Philippe |
分类号 |
A61K8/00;A61K8/18;A61Q3/00;A61K45/06;A61K9/48;A61K31/7004;A61K31/70;A61Q7/00;A61K8/60;A61K8/97;A61K36/54;A61Q5/00 |
主分类号 |
A61K8/00 |
代理机构 |
Foley & Lardner LLP |
代理人 |
Foley & Lardner LLP |
主权项 |
1. A method to stimulate the growth of hair and nails and/or to slow the loss of the hair and nails by reducing inflammation, comprising administering to a person in need thereof a composition comprising at least one C7 sugar or a derivative of formula (I) and a pharmaceutically acceptable excipientwherein:
Ra represents a hydrogen atom and Rb represents —OR2 or CRaRb represents a CO radical; R1, R2, R3, R4, R5, R6 and R7 represent, independently of one another:
a hydrogen atom ora —(CO)—R radical wherein R represents a saturated or unsaturated hydrocarbon chain containing from 11 to 24 carbon atoms, optionally substituted by hydroxy radicals (—OH), ethoxy radicals (—OC2H5) and an —SO3M group with M representing a hydrogen atom, an ammonium ion (NH4+) or a metal ion; ora —(CO)—R′ radical wherein R′ represents a saturated or unsaturated hydrocarbon chain containing from 2 to 10 carbon atoms, optionally substituted by hydroxy radicals (—OH), ethoxy radicals (—OC2H5) and an —SO3M group with M representing a hydrogen atom, an ammonium ion (NH4+) or a metal ion; and at least one of R1, R2, R3, R4, R5, R6 and R7 is —(CO)—R or —(CO)—R′. |
地址 |
Courbevoie FR |