LIQUID JETTING APPARATUS AND METHOD FOR CLEANING WIPER

摘要

There is provided a liquid jetting apparatus including: a liquid jetting head including a liquid jetting surface; a wiper including first and second wiping portions; a moving mechanism; a liquid discharge mechanism; and a controller configured to perform: controlling the moving mechanism to cause the first wiping portion to wipe the liquid jetting surface in a state that the first wiping portion is brought into contact with the liquid jetting surface; controlling the moving mechanism to cause the second wiping portion to wipe the liquid jetting surface in a state that the second wiping portion is brought into contact with the liquid jetting surface; and controlling the liquid jetting head to jet the liquid from the nozzles such that the liquid makes a contact with the second wiping portion to clean the second wiping portion.

主权项

1. A liquid jetting apparatus configured to jet liquid, comprising:
a liquid jetting head including a liquid jetting surface in which a plurality of nozzles are formed; a wiper configured to wipe the liquid jetting surface of the liquid jetting head and including a first wiping portion which is configured to wipe away liquid adhering to the liquid jetting surface and a second wiping portion which is configured to eliminate a foreign substance adhering to the liquid jetting surface; a moving mechanism configured to move at least one of the wiper and the liquid jetting head such that the wiper is moved relative to the liquid jetting head in a direction parallel to the liquid jetting surface; a liquid discharge mechanism configured to discharge the liquid from the nozzles of the liquid jetting head; and a controller configured to control the liquid jetting head, the moving mechanism, and the liquid discharge mechanism, the controller being configured to perform:
controlling the moving mechanism to cause the first wiping portion to wipe the liquid jetting surface in a state that the first wiping portion is brought into contact with the liquid jetting surface;controlling the moving mechanism to cause the second wiping portion to wipe the liquid jetting surface in a state that the second wiping portion is brought into contact with the liquid jetting surface; andcontrolling the liquid jetting head to jet the liquid from the nozzles such that the liquid makes a contact with the second wiping portion to clean the second wiping portion.