发明名称 QUATERNARY AMMONIUM HYDROXIDE COMPOUND AND METHOD OF PRODUCING THE SAME, WAFER CLEANING COMPOSITION AND WAFER CLEANING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a novel quaternary ammonium hydroxide compound suitable for wafer cleaning.SOLUTION: This invention relates to a quaternary ammonium hydroxide compound represented by a compound of the following formula.
申请公布号 JP2014218459(A) 申请公布日期 2014.11.20
申请号 JP20130098502 申请日期 2013.05.08
申请人 SHIN ETSU CHEM CO LTD 发明人 YANAGISAWA HIDEYOSHI
分类号 C07D487/08;C11D7/32;H01L21/304 主分类号 C07D487/08
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