COLLOIDAL SILICA ABRASIVE MATERIAL AND METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a colloidal silica abrasive material which shows an excellent polishing rate in a polishing process of a synthetic quartz glass substrate and can suppress scratches and fine defects on the substrate surface, and a method for producing the synthetic quartz glass substrate using the same.SOLUTION: The colloidal silica abrasive material comprises a colloid solution containing spherical colloidal silica abrasive grains and associative colloidal silica abrasive grains. The colloidal silica abrasive material provides a faster polishing rate than polishing using a conventional colloidal silica and suppresses fine defects on the substrate surface to provide high smoothness. The abrasive material can be used as a substitute for cerium oxide when polishing from a lapping face and can be as a part of a solution to the rare earth problem.