发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 According to one embodiment, a semiconductor light emitting device includes a semiconductor layer including a first surface, a second surface opposite to the first surface, and a light emitting layer; a p-side electrode provided on the second surface of the semiconductor layer in a region including the light emitting layer; an n-side electrode provided on the second surface of the semiconductor layer in a region not including the light emitting layer; an insulating film being more flexible than the semiconductor layer, the insulating film provided on the second surface and a side surface of the semiconductor layer, and the insulating film having a first opening reaching the p-side electrode and a second opening reaching the n-side electrode; a p-side interconnection layer provided on the insulating film and connected to the p-side electrode; and an n-side interconnection layer provided on the insulating film and connected to the n-side electrode.
申请公布号 US2014329348(A1) 申请公布日期 2014.11.06
申请号 US201414334164 申请日期 2014.07.17
申请人 Kabushiki Kaisha Toshiba 发明人 Hamasaki Hiroshi;Kojima Akihiro;Sugizaki Yoshiaki
分类号 H01L33/62 主分类号 H01L33/62
代理机构 代理人
主权项 1. A method for manufacturing a semiconductor light emitting device, comprising: forming a semiconductor layer including a light emitting layer on a substrate; forming a separation groove in the semiconductor layer; forming an electrode on the semiconductor layer; forming an first insulating film so as to form on the semiconductor layer and a bottom surface of the separation groove; forming a contact portion and an interconnection portion, removing the substrate from the semiconductor layer after forming the interconnection portion; and singulating the semiconductor light emitting device by cutting the first insulating film at the separation grove after removing the substrate from the semiconductor layer.
地址 Tokyo JP